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Scientist - Development of lateral GaN-HEMT transistors with ferroelectric gate architecture (m/f/div)

12 Mar 2024

Job Information

Organisation/Company
NaMLab gGmbH
Department
Research
Research Field
Physics » Solid state physics
Physics » Electronics
Engineering » Electrical engineering
Chemistry » Physical chemistry
Technology » Materials technology
Technology » Nanotechnology
Researcher Profile
First Stage Researcher (R1)
Country
Germany
Application Deadline
Type of Contract
Temporary
Job Status
Full-time
Hours Per Week
40
Offer Starting Date
Is the job funded through the EU Research Framework Programme?
H2020
Reference Number
101111890
Is the Job related to staff position within a Research Infrastructure?
No

Offer Description

NaMLab gGmbH is a research organization and associated institute of the Technical University Dresden. NaMLab provides industry-oriented and basic research in material science for electronic devices. Based on its key expertise in dielectric materials for semiconductor devices, NaMLab focuses on the integration and application of materials applied to reconfigurable and energy efficiency devices. NaMLab‘s approach of placing the device rather than the material system at the center of its research activities differentiates it from other world-class material research activities in the Dresden area. Additionally, it allows taking full advantage of the already existing expertise by forming orthogonal consortia. It, therefore, fills the gap between basic materials research and its application towards electronic circuits and systems.

Advanced semiconductor power devices are a key enabler for the technological trans­formation towards a sustainable world. Wide band gap Gallium Nitride (GaN) High-Electron-Mobility-Transistors (HEMT) are the backbone of lateral GaN devices for power applications entering the electronics market. A HEMT test structure device technology has been set up at NaMLab. In this position fundamental research has to be conducted to extend the gate technology of the HEMT device with a ferroelectric gate dielectric material, thereby tuning the device threshold voltage with polarization direction and enhancing device functionality in integrated circuits. The research work can make use of the very experienced kownledge of NaMLab with ferroelectric materials and GaN technology. The result of the scientific work shall be used to obtain a PhD in Electrical Engineering at the TU Dresden.

Requirements

Research Field
Engineering » Electrical engineering
Education Level
Master Degree or equivalent
Research Field
Engineering » Electronic engineering
Education Level
Master Degree or equivalent
Research Field
Chemistry » Physical chemistry
Education Level
Master Degree or equivalent
Research Field
Physics » Solid state physics
Education Level
Master Degree or equivalent
Research Field
Physics » Electronics
Education Level
Master Degree or equivalent
Research Field
Technology » Nanotechnology
Education Level
Master Degree or equivalent
Research Field
Technology » Materials technology
Education Level
Master Degree or equivalent
Skills/Qualifications
  • Very good Master in physics, material science, electrical engineering or equivalent,
  • Good knowledge of transistor device operation and semiconductor device physics, and knowledge of GaN transistors and/or ferroelectrics is a plus.
  • Experiences and strong interest in electrical transistor characterization and data analyses
  • Experiences or knowledge in semiconductor device fabrication
  • Good technical comprehension, professional English communication and writing skills
  • Ability to work in a team environment
  • Strong perseverance in experimental work
  • Self-organized and conscientious way of working
Specific Requirements

non

Languages
ENGLISH
Level
Excellent
Languages
GERMAN
Level
Basic
Research Field
Engineering » Electrical engineeringPhysics » Solid state physicsTechnology » Materials technology

Additional Information

Benefits
  • Collaboration with a dedicated, inspiring, interdisciplinary team working on leading technologies
  • Research work on innovations originating from materials science and microelectronic devices
  • focused guidance throughout the project
  • Room for independent work and creative collaboration
  • Flexible working time models for work life balance.
Eligibility criteria

We value and encourage the diversity of our employee skills and therefore welcome all applications - regardless of age, gender, nationality, ethnic and social origin, religion, ideology, disability, sexual orientation and identity.

Selection process
  • Two-Stage interview process after initial application forms received
Additional comments

Tasks

  • Fabrication of transistors with semiconductor micro-technology processes in NaMLab cleanroom on available AlGaN/GaN heterostructure material.
  • Electrical and physical characterization of these transistors for conceptual validation.
  • Detailed electrical characterization in dynamic tests (switching) of the ferroelectric properties and their impact on device performance
  • Process engineering and optimization in experiments for improvement of material properties and device performance
  • Working in an interdisciplinary team together with other PhD students and technicians.
  • Alignment in larger project consortia with academic and industrial partners
Website for additional job details

Work Location(s)

Number of offers available
1
Company/Institute
NaMLab gGmbH
Country
Germany
State/Province
Saxony
City
Dresden
Postal Code
01187
Street
Nöthnitzer Straße 64a

Where to apply

E-mail
jobs@namlab.com

Contact

State/Province
Saxony
City
Dresden
Website
Street
Noethnitzer Str. 64a
Postal Code
01187
E-Mail
jobs@namlab.com