CRYSTALLINE PhD position - Plasma Atomic Layer Etching of AlN and AlScN thin films for Photonics and MEMS applications (f/m/d)

• Master's degree in physics, chemistry, micro/nanotechnology or related fields.
• Advanced knowledge in plasma physics/chemistry.
• Previous experience in plasma etch/CVD and micro/nano fabrication.
• Basic knowledge of plasma diagnostics tools (OES, RFEA).
• Characterization skills in at least two of the listed instruments: SEM, AFM, ellipsometry, profilometry.
• Knowledge of surface characterization techniques are required, and knowledge of III-N materials is an advantage.
• Excellent written and oral communication skills in English.
• Enthusiasm for independent developing of new ideas and a positive attitude towards new challenges. 
• Optional: Knowledge of surface characterization techniques and III-N materials.

In order for a JS candidate to be eligible for CRYSTALLINE, she or he has to comply with the MSCA-COFUND Doctoral Program (DP) eligibility rules, specific CRYSTALLINE application requirements, and with fundamental ethic principles.

The MSCA-COFUND DP rules require
researchers to (i) be doctoral candidates, i.e., not already in possession of a doctoral degree at the call deadline (whereas researchers who have successfully defended their doctoral thesis but who have not yet formally been awarded the doctoral degree will not be considered eligible), and to (ii) meet the MSCA mobility rule, i.e., have not resided and/or carried out their main activity (work, studies, etc.) in Austria for more than 12 months in the 3 years immediately before the call deadline (time spent as part of a procedure for obtaining refugee status under the Geneva Convention is not taken into account).

The CRYSTALLINE application requirements are met if an applicant (i) holds a master’s degree in a technical discipline, (ii) provides a complete set of application documents, and (iii) complies with the submission rules for the application documents as laid out at the CRYSTALLINE website.