Spin electronics (M/W)

Development of technological processes for the micro- and nanofabrication of magnetic tunnel junctions at the Institut Jean Lamour.
Use an existing UV lithography process.
Develop a submicron tunnel junction nanofabrication process using electron lithography
Once the devices have been fabricated, the successful candidate will be required to characterize them electrically using existing protocols and measurement benches.

Carry out micro and nano-manufacturing processes using all the equipment available in the clean room (electronic lithography, optical lithography, dry engraving, deposits, annealing). He will have to master the sequence of process steps. It will perform electrical characterizations of devices developed to assess the quality of manufacturing processes.

The Institute Jean Lamour (IJL) is a joint research unit of CNRS and Université de Lorraine.
Focused on materials and processes science and engineering, it covers: materials, metallurgy, plasmas, surfaces, nanomaterials and electronics.
The IJL has 263 permanent staff (30 researchers, 134 teacher-researchers, 99 IT-BIATSS) and 394 non-permanent staff (182 doctoral students, 62 post-doctoral students / contractual researchers and more than 150 trainees), of 45 different nationalities.
Partnerships exist with 150 companies and our research groups collaborate with more than 30 countries throughout the world.
Its exceptional instrumental platforms are spread over 4 sites; the main one is located on Artem campus in Nancy.
The study will be carried out within the 101 team.