22/06/2019
The Human Resources Strategy for Researchers

PhD student in Materials Science & Photolithography

This job offer has expired


  • ORGANISATION/COMPANY
    CNRS
  • RESEARCH FIELD
    ChemistryPhysical chemistry
    PhysicsBiophysics
    PhysicsChemical physics
  • RESEARCHER PROFILE
    First Stage Researcher (R1)
  • APPLICATION DEADLINE
    12/07/2019 23:59 - Europe/Brussels
  • LOCATION
    France › MULHOUSE
  • TYPE OF CONTRACT
    Temporary
  • JOB STATUS
    Full-time
  • HOURS PER WEEK
    35
  • OFFER STARTING DATE
    01/10/2019

This PhD project will be conducted by the Mulhouse Materials Science Institute (IS2M) at the University of Haute Alsace (UHA) in the Molecules, Nano- and MicroStructures (MNMS) research group and in close collaboration with the Laboratory for Innovative Key Materials and Structure (LINK CNRS UMI 3629) in Japan.
The IS2M is a joint research unit CNRS-UHA (UMR 7361), uniting more than 170 people and member of the Carnot Institute MICA (Materials Institute Carnot Alsace), the Research Federation 'Materials and Nanoscience of the Great East (FR 3627). Due to its multidisciplinary character, its scientific impact and its interactions with other fields, IS2M is one of the structuring forces of the Materials landscape and their applications in the academic and industrial world. Within the IS2M, the MNMS axis (Molecules Micro Nano Structures functional) develops original micro-nano-fabrication processes, based in particular on photo-induced phenomena. An important part of the experimental and theoretical work is dedicated to the study of the chemical, photochemical, physicochemical or physical processes involved. The study of the original properties of functional micro-nanostructures makes it possible to develop applications in fields in which these structures are interesting, such as microsensors, photonics, biology, etc.

The thesis will be carried out within the IS2M research team PHOTON (Photomaterials for Optics and Nanotechnologies) from the group Molecules, Nano- and MicroStructures (MNMS) involved in the research and optimization of all aspects related to photoinduced chemical processes. The team has DUV photolithography setup operating at 193 nm and 266 nm to structure NP photoresins at the micro and nano scale. Spectroscopy systems (spectroscopic ellipsometry, FTIR, Raman, ...), microscopy (SEM, TEM, AFM) and optical, magneto-optical and electrical characterization are also available for studying the physical properties of materials.

The monitoring of the work will be organized around weekly meetings between the PhD student and his / her thesis supervisor. To promote as much as possible exchanges between the PhD student and the researchers involved in this project (LINK & IS2M), a monthly meeting by webex or conference call will be organized, and at least three meetings in person per year are planned between the two partners , work meetings and scientific exchanges in which the PHD student will have his place.
The person recruited by IS2M will have the opportunity to stay at LINK (Japan) for 6 months in order to acquire the basics of colloid chemistry and become familiar with the thin-film processes that are used.

The PhD student will be supported by various experts (platform engineer, researcher, ...) at IS2M to acquire the tools and methods necessary for the good progress of the PhD work.

He/She will have to follow a certain number of lecture and training offered by the Doctoral School (ED182 - Physics and Chemistry-Physics) to which he / she will be attached, the latter being taught on very varied fields. He/She will be integrated into the life of the team (MNMS axis) by participating to the regular group meetings, which allow PhD Students to exchange their points of view and have a feedback on their respective work.

The selected applicant will have professional prospects that can be enrolled either in Europe or in Asia. The subject of the thesis being multidisciplinary with a strong experience of collaboration will Contribute to his/her futur professional insertion professional. This 3 year research experience will allow him to consider an academic or industrial career at the end of his PHD. This project been realized int the fram of and international collaboration will also enable him/her to validate a high-level research experience abroad, which opens up prospects for responsibility and international positions.
The valorization of the PhD works is foreseen by academic publications and/or by industrial valorisation (validation of a prototype, envisaged patent deposit), which makes this PhD project a good opportunity to pursue in these two ways . An attraction of this thesis for the prospective candidate is to complete his initial training in the field of physico-chemistry of materials, optical lithography and the physical properties of materials.
The PhD student will be accompanied in the writing of articles of scientific valorization and in the preparation of oral presentations in at least 1 national congress and 1 international congress during the PhD. The objective is that the doctoral student is able, at the end of his thesis, to develop independently his scientific work.

The PhD is part of an ANR project DUVNANO, a multidisciplinary project that aims to meet the demand for new simple processes for the preparation of thin films by proposing the combined use of colloidal nanocrystal solutions and deep UV photolithography processes (DUV: 266 & 193 nm) . DUVNANO project involves two highly specialized partners in colloidal chemistry and photolithography DUV respectively: Laboratory for Innovative Key Materials and Structure - LINK (CNRS UMI 3629) and Institute of Materials Science Mulhouse - IS2M (CNRS UMR 7361). DUVNANO makes the choice to cover a wide range of materials to set up a new process rather than aiming for a particular application. The control of this new process will, however, be validated through the production of simple components such as field effect transistors (FETs) or optical networks, devices that find their interest in the field of "smart windows" for example.
The originality of DUVNANO lies in the use of colloidal nanocrystal solutions as negative light-sensitive photosensitive elements for the direct writing of functional microstructures by DUV photolithography. Indeed, the DUV irradiation has the unique property of allowing the crosslinking of nanocrystals (NCs) or nanoparticles (NPs) without any additional heat treatment. With this method, micro-nanostructured inorganic thin films could be obtained in a single step, at room temperature, by a simple method and compatible with flexible substrates. Research on coating materials and processes suitable for synthesis routes in solution is of great interest from an industrial point of view, in fact, thin films play a very important and indispensable role in everyday life with a value estimated $ 10 billion in 2018.

Thin layers, ranging in thickness from a few nanometers to a few micrometers, play a very important and indispensable role. Semiconductor electronic devices and optical coatings are one of the main applications of thin-film technology. They are generally manufactured by physical vapor deposition (sputtering, evaporation, laser ablation ...), by chemical vapor deposition (ALD, CVD ...) or by chemical solution deposition (sol-gel ...). In recent years, the concept of "one crystal per device" has emerged. It shows the need to develop materials and processes that allow bottom up production [1]. The challenge is the development of nanomaterials that have specific properties and that can be used for the realization of devices with a low cost manufacturing method, on large surface and on flexible substrates. The device is made from the assembly of nanometric-sized compounds (quantum dots, carbon nanotubes, etc.) by unconventional methods, such as solution methods and additive manufacturing. However, the passage of materials consisting of "loose" monocrystals, disordered to organized assemblies poses real challenges, especially that of the role of interfaces [2]. These last are mainly at the origin of a fall of the performances of the device. In addition, in the case of nanostructured devices, photolithography is an important part of the manufacturing process and uses photopolymer resins. Optical lithography is a method of choice combining high resolution and low cost per structure [3]. Nevertheless, organic resins generate contamination and can be sources of other by-products.

In recent years, IS2M has developed an approach based on metal oco-clusters for the preparation of metal oxide nanostructures by photolithography on DUV. In our previous work, we have shown that DUV is effective for the crosslinking of oxo-clusters of TiO2, ZnO or ZrO2 [4]. However, the final material is still amorphous, which strongly limits its applications. Crystallisation is only possible after thermal annealing (T> 400-500 ° C). Very recently, IS2M has demonstrated the proof of concept of the ZnO NP crosslinking synthesized by the LINK laboratory, thus demonstrating the possibility of expanding the DUV configuration to crystallized NPs. This gives proof of concept of the objective of this thesis, which is to obtain, immediately after irradiation with DUV, fully inorganic and nanocrystallized patterned materials.

Our approach thus has some similarities with that of Y. Wang et al., Introduced in Science in 2017 [5]. They proposed a chemical approach without photoresist, which used a nanomaterial direct optical lithography

[1] C.R. Kagan et al., Building Devices From Colloidal Quantum Dots, Science, 353 (2016) 6302,
[2] J.H. Choi et al., Exploiting the Colloidal Nanocrystal Library to Construct Electronic Devices, Science, 352 (2016) 6282
[3] C.A. Mack, Fundamental Principles of optical lithography, Wiley, 2007
[4] F. Stehlin et al., J. Mater. Chem. C 2 (2014) 277; C.C. Yeh et al., J. Mater. Chem. C 5 (2017) 2611,
[5] Y. Wang et al., Direct optical lithography of functional inorganic nanomaterials, Science, 357 (2017) 385
[6] Grasset F. et al., Adv. Mater. 17 (2005) 294 ; Grasset F. et al., Adv. Mater., 20 (2008) 1710 ; Grasset F. et al., Adv. Mater., 20 (2008) 143; Nerambourg N. et al., J. Colloids Inter. Sci. 424 (2014) 132 ; Nguyen T.K.N. et al., J. Electrochem. Soc., 164 (2017) D412; Nguyen T.K.N. et al., J. Mater. Chem. C 5 (2017) 10477; Valour A. et al., Solid State Sciences, 54 (2016) 30
[7] Yeh, C. C. et al., Adv. Mater. Interf. 3 (2016), 12 ; Yeh, C. C. et al., Adv. Mater. Interf. 4 (2017), 1700738

We are looking for an enthusiastic and rigorous candidate with a master's degree in the field of physical-chemistry, materials science or related fields and who enjoys experimentation works.
The candidate will have to be familiar with the classical characterization experimental methods (UV-Vis spectroscopy, IR, ...) and an experience in photolithography will be highly appreciated.
The following skills and knowledge are sought: photochemistry, photophysics and more generally a good knowledge of materials and physical characterization methods.
-The candidate must be able to integrate the project, interact with the members of the research teams involved as well as with people in charge of the characterization platform.
-He / she will also have to know how to work independently.
-Proficient in spoken and written English.

Required Research Experiences

  • RESEARCH FIELD
    ChemistryPhysical chemistry
  • YEARS OF RESEARCH EXPERIENCE
    None
  • RESEARCH FIELD
    PhysicsChemical physics
  • YEARS OF RESEARCH EXPERIENCE
    None
  • RESEARCH FIELD
    PhysicsBiophysics
  • YEARS OF RESEARCH EXPERIENCE
    None

Offer Requirements

  • REQUIRED EDUCATION LEVEL
    Chemistry: Master Degree or equivalent
    Physics: Master Degree or equivalent
  • REQUIRED LANGUAGES
    FRENCH: Basic
Work location(s)
1 position(s) available at
Institut de Sciences des Matériaux de Mulhouse
France
MULHOUSE

EURAXESS offer ID: 420023
Posting organisation offer ID: 10250

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